Gases [ Return towards Electronic (Semiconductors, TFT-LCD) ]
To support each step of semiconductor, TFT-LCD manufacturing industry, Air Liquide is your competent partner. We are capable to provide you with carrier gases (H2, N2, O2, Ar, He...) and specialty gases (SiH4, NH3, SiF4...) through various supply modes in your desired purity specifications.
Ammonia
Application: cleaning of wafers, generating a silicon nitride layer in the CVD-process
Container: 47L,50L,440L,930L
Boron Trichloride
Application: plasma etching, boron supplier for the ion implantation (n-doping)
Container: 47L
Carbon Dioxide
Application: CVD, modification of the electrical conductivity of DI-water
Container: 40L,44L
Carbon Monoxide
Application: together with octafluorocyclobutane (C4F8) for plasma etching
Container: 47L,49L
Chlorine
Application: plasma etching, oxidation of silicon
Container: 44L,47L,440L
Chlorine Trifluoride
Application: chamber cleaning of diffusion furnace
Container: 40L
Compressed Air
Application: Control air
Diborane
Application: boron supplier for the ion implantation (p-doping) and for the epitaxy
Container: Cylinder
Dichlorosilane
Application: for the generation of silicon dioxide and silicon nitride layers in the CVD and the generation of silicon
Container: 40L
Fluoromethane
Application: etching gas / plasma etching
Container: 7L
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