To support each step of photovoltaic industry, Air Liquide provides you with carrier gases (H2, N2, O2, Ar, He...) and specialty gases (NH3, SiH4...) through various supply modes in your desired purity specifications.
Diborane
Application: Boron supplier for the ion implantation (p-doping) and for the epitaxy
Container: Cylinder
Diethyl Zinc
Application: TCO layer
Container:
Helium
Application: For cooling
Container: 10L,47L,50L,piping
Methane
Application: Doping gas
Container: 47L,50L
Nitrogen Trifluoride
Application: Chamber cleaning
Container: 10L,44L,47L,Bundle,Ton-tank,ISO-Trailer
Oxygen
Application: Chamber cleaning
Container: 47L, Piping
Phosphine
Application: Doping gas
Container: 47L
Silane
Application: As silicon source in the epitaxy, in the low temperature silicon dioxide CVD and in the silicon nitride CVD
Container: 47L,50L,440L,Bundle(16cyl,28cyl),ISO(20feet 8-tube)
Tetrafluoromethane
Application: Pure or in mixture with oxygen for the plasma etching of silicon dioxide, silicon nitride, polycrystalline silicon and some silicon-metal compounds before the CVD-process
Container: 47L,50L
Trimethylboron
Application: Doping gas
Container: 49L